Thrust 2: Imaging, Patterning, and Metrology

In this thrust we are exploiting the short wavelength and high coherent attributes of the EUV laser output to implement testbeds for EUV imaging, patterning and metrology. Present activities involve EUV and soft x-ray microscopy, EUV interferometry, EUV print exposures and EUV holographic lithography.

Critical to the use of compact EUV sources in these application testbeds is the development of EUV optical components. Available to the ERC are unique nanofabrication facilities at Lawrence Berkeley Laboratory Center for X-Ray Optics and high quality EUV mirror coating facilities at several of the core institutions.

These efforts provide evidence of the great potential of EUV light in support of nanotechnology.

Recent Results

• Compact 47 nm imaging system reaches 130 nm resolution: (picture below)
• 15nm resolution obtained in imaging experiments using 2.07nm synchrotron light: (picture below)
• State of the art free standing zone plates demonstrated.
• Tabletop patterning tool at 47nm with the capability to print 30nm lines demonstrated: (picture below)
• Demonstration of sub-38 nm resolution imaging with compact EUV source: (picture below)
• High resolution imaging of magnetic material: (picture below)
• Nanotomographic imaging of biological materials: (picture below)

• EUV laser ablation down to 82 nm.
• Dense Plasma Interferometry.

Projects

1. High Resolution Soft X-Ray Microscopy with Synchrotron Radiation.
2. High Resolution Microscopy with Tabletop EUV Lasers.

   a. <30 nm spatial resolution with EUV lasers.

   b. < 100 nm spatial resolution with 46.9 nm capillary discharge laser illumination.

   c. Smallest EUV microscope uses desktop size EUV laser illumination.

3. Lenseless imaging using High Harmonic EUV Light Sources: (picture below)
4. Lambda = 13 nm interferometry Test Bed for the Metrology of EUV Lithography Optics.
5. Laser Interferometry of Very Dense Plasmas.
6. Nanopatterning with Compact EUV Lasers.
7. Demonstration of Nanometer-scale Ablation with a Focused EUV Laser Beam: Development of a LIBS Nanoprobe in Collaboration with Corporate Partner JMAR.

Publications

For more information see: Lawrence Berkeley National Laboratory and Carmen Menoni's Homepage