EUV Table-Top Microscope is Awarded a 2008 R&D 100 Award

Professor Carmen Menoni and other principal investigators from Colorado State University, Lawrence Berkeley National Lab, UC Berkeley and Lebedev Physical Institute in Moscow,along with graduate students on the research effort, received the R&D 100 Award at a ceremony held in Chicago on October 16, 2008. Awarded was the EUVM-1, the first EUV Microscope based on a table-top EUV laser source which extends the range of resolution for light-based imaging. For the announcement, click here.

To view a short (150 seconds) video on the EUVM-1 microscope, click here.

If you would like more information on the EUV Microscope, or a copy of the product brief, or wish to pursue exploring the opportunities of EUV science and technology for applications, please contact Hugh Grinolds.

Industry Outreach

EUV radiation has played an important role for decades in scientific pursuits including surface science, atomic and molecular science, solar physics and others. A major acceleration, however, is presently underway. The widespread pursuit of nanoscience and nanoengineering benefits from the availability of radiation with comparable wavelengths for metrology and characterization, and in some cases for direct pattern formation. As a consequence many new scientific and technological opportunities are emerging that require compact, widely available tools. A particular case, and a strong driver of the current expansion of activities, is that of EUV lithography for the high volume manufacture of future computer chips. Current industry timelines call for this new technology to be used for the manufacture of 19 GHz microprocessors in the year 2010-2012. To meet these ambitious goals a substantial new infrastructure is required, including component vendors, instrument suppliers small and large, all requiring a well-trained staff.

Our current view of the enabling materials applications for our EUV sources is displayed below (click here for a pdf file of the same):

To help meet the needs of the emerging industry we have formed a broadly based Industrial Advisory Board (IAB), to help guide our EUV Engineering Research Center. Our goal is to have a broad impact on science and technology, from small scale university research to large scale manufacturing. Towards that end we organized an IAB with members from small, medium and large corporations, with as wide as possible scientific and technical interests. We receive their individual and collective advice, work closely with them on special projects, and serve as an intellectual center where they can come for EUV related expertise, interact with each other and, through our teaching and research, meet and hire well trained future employees.

Specific benefits are available to industry members of the EUV ERC (click here for a pdf file of the same):

• The first EUV ERC industry meeting was held in Berkeley Nov. 21 2003. Eleven industry representatives attended. Several other companies could not attend but contributed. Since that time, IAB meetings have been held each year with the sites chosen as convenient to member participation. The last meeting was February 25, 2008 in San Jose, CA.
  
  
• Corporate Membership Agreements and Center Bylaws were prepared with inputs from all parties and finalized May 4, 2004.
  
  
• Currently, there are 18 industry members to the EUV ERC.